"Fundamentals of PMI," ICOPS-SOFE 2011, Chicago, Illinois
"Plasma Used for Semiconductor Processing: How and Why the work," APCPST 2010, Korea
NPRE 458. "ECAP", 2015
NPRE 458, "Gd Pellets for EUV", 2014
NPRE 458, "Diesel Engine Exhaust", 2013
NPRE 458, Plasma Torch for Deposition, 2008
For more detail including funding source information, see the plasma-material interaction group website or link directly to: http://cpmi.illinois.edu
Atmospheric Plasmas for Coating Applications
Extreme ultraviolet (EUV) sources for lithography and physical vapor deposition
Plasma processing of semiconductors
Atomic properties of potential first-wall materials
Modeling of edge-plasma atomic physics
Experimental fusion research
Plasma Edge and PMI Modeling
Plasma Physics and Fusion
Plasma Sources and Processing
Books Authored or Co-Authored (Original Editions)
Ruzic, D. N., "Electric Probes for Low-Temperature Plasmas," (AVS Monograph Series, New York, 1994).
Ruzic, D. N., "Hydrogen Collision Dynamics on a Rough Nickel Surface," Video Book: 1st Edition (American Vacuum Society Series VL-5, New York, 1991).
Books Authored or Co-Authored (Revisions)
Ruzic, Neil P., and D. N. Ruzic, “Racing to a Cure” second edition. (University of Illinois Press, Champaign IL, 2006)
Books Edited or Co-Edited (Original Editions)
Guest Editor, Plasma Science, Special Issue on Images in Plasma Science, 24 (1996)
Chapters in Books
Lithium: Technology, Performance and Safety, D. Andruczyk and D. N. Ruzic, "Thermoelectric Effects of Lithium," F.L. Tabares, Ed., Nova Science Pub Inc. Sept. 2013.
Chapter 2 of Plasma Processing of Nanomaterials, J. Sporre and D. Ruzic, "Extreme Ultraviolet Light Lithography for Producing Nanofeatures in Next-Generation Semiconductor Processing,"R. M. Sankaran, Ed., CRC Press, Boca Raton, 2012, p. 35-54.
Contamination, Chapter 6C 40pp. D.N. Ruzic and S.N. Srivastava in EUV Lithography Ed. V. Bakshi, (SPIE press, Bellingham WA, 2008)
Chapter 36 of EUV Lithography. (37 pages) The chapter is entitled Origin of Debris in EUV Sources and its Mitigation, by David N. Ruzic. Edited by Vivek Bakshi, SPIE Book Series, 2005.
Chapter 3 of "Plasma Handbook of Processing Technology." The chapter is entitled, "Fundamentals of Sputtering and Reflection," by David N. Ruzic. (Noyes, Park Ridge, NJ) edited by S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, 70-90 (1990).
Selected Articles in Journals
J. Sporre and D. N. Ruzic, "Debris Transport Analysis at the Intermediate Focus of an EUV Light Source." Journal of Micro/Nanolithography, MEMS and MOEMS, 11(2), 021117 (2012).
S. Jung, D. Andruczyk, and D. N. Ruzic, "Laboratory Investigation of Vapor, "Shielding for Lithium-Coated Molybdenum in DEVeX", IEEE Transactions in Plasma Science 40(3) 2012.
C. Castano, M. Agharzarian, J. Caughman, D. Ruzic, "Visual and Electrical Evidence Supporting a Mechanism of Vacuum Breakdown MS," IEEE Transactions on Plasma Science, 40(4) (2012).
Z. Ouyang, L. Meng, P. Raman, T. S Cho and D N Ruzic, “Laser-assisted plasma coating atatmospheric pressure: production ofyttria-stabilized zirconia thermal barriers”, J. Phys. D: Appl. Phys. 44 (2011) 265202
L. Meng, A. N. Cloud, S. Jung and D. N. Ruzic, Study of Plasma Dynamics in a Modulated Pulsed Power Magnetron Discharge Using a Time-Resolved Langmuir Probe, Journal of Vacuum Science & Technology A 29(1), Jan/Feb 2011.
D.N. Ruzic, W. Xu, D. Andruczyk and M.A. Jaworski, "Lithiummetal infused trenches (LiMIT) for heat removal in fusion devices," Nuclear Fusion, 51, 102002 (2011).
S. Jung, V. Surla, T. K. Gray, D. Andruczyk, and D. Ruzic, "Characterization of a theta-pinch plasma using triple probe diagnostic," Journal of Nuclear Materials (2011).
D. N. Ruzic and V. Surla, "High-energy density beams and plasmas for micro- and nano-texturing of surfaces by rapid melting and solidification," J. Phys. D: Appl. Phys. 44, 174026, (2011).
V. Surla, M. Tung, W. Xu, D. Andruzcyk, M. Neumann, D. N. Ruzic and D. Mansfield, "Seebeck coefficient measurements of lithium isotopes," Journal of Nuclear Materials 415, 18–22 (2011).
Dulkin, E. Ko, L. Wu, I. Karim, K. Leeser, K. J. Park, L. Meng, and D. N. Ruzic, “Improving the quality of barrier/seed interface by optimizing physical vapor deposition of Cu film on hollow cathode magnetron,” J. Vac. Sci. Technol. A 29(4) (2011) 041514.
V. Surla, P. Raman, D. Burns, M.J. Neumann, D.N. Ruzic, "Physical and chemical erosion studies of lithiated ATJ graphite," Journal of Nuclear Materials (2011).
D. N. Ruzic and J. P. Allain, “Guest editorial special issue on symposium on fusion engineering,”IEEE Transactions on Plasma Science, Vol. 38, No. 3 Part 1, p 222-223 (2010).
K. Ibano, D. Ruzic, and V. Surla, Sputtering and thermal evaporation studies of lithiated ATJ graphite, IEEE Transactions on Plasma Science, Vol. 38, No. 3 part 1, p 341-345 (2010).
C. R. Struck, R. Flauta, M.J. Neumann, K.N. Kim, R. Raju, R. L. Bristol, D.N. Ruzic, Grazing Incidence Broad Ion Beams for Reducing Line-Edge Roughness, Journal of Micromechanics and Microengineering, Vol. 20, No. 7 (2010)
V. Surla, M. A. Jaworski, T. K. Gray, K. Ibano, W. Xu, M. J. Neumann, and D. N. Ruzic, Lithium research as a Plasma Facing Cmponent Material at the University of Illinois Thin Solid Films, Vol. 518, No. 22, pp. 6663-6666 (2010)
R. Raju, L. Meng, R. Flauta, H. Shin, M. J. Neumann, T. A. Dockstader and D. N. Ruzic, Development and Characterization of a Secondary RF Plasma-Assisted Closed-Field Dual Magnetron Sputtering System for Optical Coatings on Large-Area Substrates, Plasma Sources and Technology, 19, 025011 (2010).
M. A. Jaworski, T. K. Gray, M. Antonelli, J. J. Kim, C.Y. Lau, M. B. Lee, M. J. Neumann, W. Xu, and D. N. Ruzic, Thermoelectric Magnetohydrodynamic Stirring of Liquid Metals Physics Review Letters, 104, 094503 (2010).
L. Wu, E. Ko, A. Dulkin, K. J. Park, S. Fields, K. Leeser, L. Meng and D. N. Ruzic, Flux and energy analysis of species in hollow cathode magnetron ionized physical vapor deposition of copper , Review of Scientific Instruments 81, 123502 (2010)
M. Racic, K. Ibano, R. Raju and D.N. Ruzic, Physical Erosion Studies of Plain and Lithiated Graphite, Journal of Nuclear Materials, 390-391, pp. 1043-1047 (2009).
J. Sporre, C. H. Castano, R. Raju, and D. N. Ruzic, Ionic Debris Measurement of Three Extreme Ultraviolet Sources," Journal of Applied Physics, 106, 4 (2009).
H. Qiu, S. N. Srivastava, K. C. Thompson, M. J. Neumann, D. N. Ruzic The Effectiveness of Mo-Au Gibbsian Segregating (GS) Alloys and The Surface Removal Effect on the GS Performance for EUV Collector Optics Optics Engineering, 48, 056501 (2009).
"Plasma-Assisted Cleaning by Metastable Atom Neutralization", TF08156, disclosed August 2008, patent applied for
"Method to Produce Nanoscale Three Dimensional Porous Silicon Patterns and Applications in Self-Integrated High Aspect Ratio Vias or Trenches with Build-in Low K Porous Dielectrics and Wafer Level Packaging Integration", TF08145, disclosed July 2008,patent applied for
"Line-Edge Roughness Reduction Technique", TF07128, disclosed October 2007, patent applied for
Plasma-Based Debris Mitigation for Extreme Ultraviolet (EUV) Light Source serial no. 10/628, 129 (2005), US #7, 230, 258 (2007)
Submicron Particle Removal, applied for Dec. 5, 2005, serial no. 11/293, 903, US #7,528,386 (2009)
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